These arrays can be useful in applications such as zone plate array lithography, one shot xfel focusing or in combination with a matching array of ordersorting apertures, they can be used to construct a shackhartmann wavefront sensors for beamline diagnosis applications. Zone plate focused soft xray lithography springerlink. Highthroughput synthesis of modified fresnel zone plate. Zone plate array lithography zpal uses an array of zone plates, combined with an array of micromechanical mirrors or shutters, to pattern features on a substrate without a mask. Zone plate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns in resist on a substrate. We propose a novel form of xray projection lithography that. The printing is from a stone lithographic limestone or a metal plate with a smooth surface. We have demonstrated a working zpal system in the uv regime, and are pursuing further experiments with the 4. Zone platearray lithography using synchrotron radiation a. X ray lithography photolithography x ray crystallography.
Zoneplatearraylithography is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. A simulation tool was built to examine the diffraction properties of zone plates based on scalar diffraction theory. Electrically switchable fresnel lens using a polymer. Zoneplatearray lithography using synchrotron radiation a. Fabrication of a fresnel zone plate through electron beam lithographic. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips. The zones can be spaced so that the diffracted light constructively interferes at the desired focus, creating an image there. Us7304318b2 system and method for maskless lithography. Exposure optimization in scanning laser lithography. Jul 19, 20 once the light reaches the pen array, three structural aspects of the array 6,22 enable it to effectively perform nearfield lithography. Greasy mediums are drawn on the surface of the stone. Fresnel rings units containing 11 concentric rings were created on the pmma layer with the outermost fresnel ring, having an external diameter of 45. Lithography is the transfer of geometric shapes on a mask to a smooth surface.
A proposal for maskless, zoneplatearray nanolithography mit. The development of a prototype zoneplatearray lithography zpal system by. An array of fresnel zone plates for use in maskless lithography, said array of fresnel zone plates being arranged on a membrane and operable for focusing an energy beam into an array of focal points on a substrate in order to create a permanent pattern thereon. Soft xrays for deep sub100 nm lithography, with and without. Zone plates are frequently manufactured using lithography. This novel method of lithography combines the economic advantages of a maskless scheme and the high throughput of a massively parallel system as well. Zone plate lithography focusing x rays tighter focus can. A zone plate is a device used to focus light or other things exhibiting wave character. Schematic of the zoneplatearraylithography zpal system. An experimental ultraviolet zpal system has been constructed and used to simultaneously expose nine different patterns with a 333 array of zone plates in a quasidotmatrix fashion. Fabrication of fresnel zone plates for soft xray and.
Authors djomehri, ihsan jahed, 1976downloadfull printable version 3. A zone plate consists of a set of radially symmetric rings, known as fresnel zones, which alternate between opaque and transparent. Rajesh menon, amil patel, david chao, mathias galus and professor henry. On exposure to light, light degrades the polymers described in more detail later. Zpal is defined as zoneplatearraylithography somewhat frequently. The ones marked may be different from the article in the profile.
It uses light to transfer a geometric pattern from a photomask also called an. Maskless, parallel patterning with zoneplate array. A lowcost complement or competitor to scanningelectronbeam lithography hi smith, r menon, a patel, d chao, m walsh, g barbastathis microelectronic engineering 83 49, 956961, 2006. Zoneplatearray lithography zpal is a maskless lithography scheme. Zone plate lithography focusing x rays tighter focus can be. Fluorescence microscopy imaging with a fresnel zone plate array based optofluidic microscope shuo pang, a chao han, a lap man lee, b and changhuei yang a, b a department of electrical engineering, california institute of technology, pasadena, ca, 91125, usa.
Focusing xrays tighter focus can be achieved with multiple exposures first pattern exposed with ebeam and features filled with gold. Zpalreplaces the printing press of traditional lithography with a technology more akin to that of a laser printer. Most wafers contain an array of the same pattern, so only one cell of. Zone plate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate. A fzp is a highly dense and symmetric structure, and can. Lithography of computergenerated holograms for freeform and aspheric surface metrology. This wavelength will allow a large depthoffocus with essentially no proximity effect at a large gap between the zone plate array and the substrate.
The areas of each ring, both light and dark, are equal. For example, scale up a zone plate up by a factor of 400 in a photo editor and print it. Desktop nanofabrication with massively multiplexed beam. Zoneplatearray lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates. Scale the zone plate by entering a multiplier for the scale value, save and print the zoneplate, then take a picture of the print. Instead of a single, massive lens, an array of hundreds. Maskless, zoneplatearray lithography zpal should be capable of producing 25 nm feature sizes at a throughput of 1 cm 2 second using 4. Zone plate array lithography is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. Read soft xrays for deep sub100 nm lithography, with and without masks, microelectronic engineering on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. In particular, ion beam lithography ibl is a noteworthy method thanks to its. Pdf alphaprototype system for zoneplatearray lithography.
Zoneplatearray lithography zpal and microscopy zpam. Photolithography, also called optical lithography or uv lithography, is a process used in microfabrication to pattern parts on a thin film or the bulk of a substrate also called a wafer. Alphaprototype system for zone plate array lithography. Request pdf immersion zoneplatearray lithography an immersion scheme is used to improve resolution, exposure latitude, and depthoffocus in zone plate array lithography zpal. Alan doolittle used for pattern transfer into oxides, metals, semiconductors. In further embodiments, an array of apodized diffractive elements may also be used. The development of a prototype zoneplatearray lithography zpal system by amil ashok patel submitted to the department of electrical engineering and computer science on may 07, 2004, in partial fulfillment of the requirements for the degree of master of science abstract. This paper presents the microarray of sifresnel rings fabricated by the electron beam lithography and reactive ion etching. Once the light reaches the pen array, three structural aspects of the array 6,22 enable it to effectively perform nearfield lithography.
Maskless, parallel patterning with zoneplate array lithography. Zone plate for focused xray beam array lithography. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing. We present a simulation study which examines the use of zone plates for lithography. Introduction to electron beam lithography bostjan bercic bostjan. Looking for online definition of zoneplatearraylithography or what zoneplatearraylithography stands for. A lowcost complement or competitor to scanningelectronbeam lithography, microelectronic engineering on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. Desktop nanofabrication with massively multiplexed beam pen lithography xing liao1,2, keith a. Zpal is defined as zone plate array lithography somewhat frequently.
Maskless lithography using a multiplexed array of fresnel. H calculate the spatial period of the outermost zones of the zone plates designed for operation at the hene wavelength 632. Massachusetts institute of technology free online course. The process itself goes back to 1796 when it was a printing method using ink, metal plates and paper. The fzps mostly exhibited high quality with zones free from defects. A significant challenge to the wide utilization of xray microscopy lies in the difficulty in fabricating adequate highresolution optics. The performance of focused soft xray lithography is compared to other direct write methods. A method is disclosed for creating a permanent pattern on a substrate. At higher doses an exposure spreading phenomenon substantially increases the lateral dimensions of the developed patterns. In order that lithographic features which cross boundaries between unit cells are free of stitching errors it is necessary that the zone plates be arranged in the array. Lithography of computergenerated holograms for freeform.
Anderson lawrence berkeley laboratory, berkeley, california 94720. By using electron beam lithography, it is possible to make a large number of identical copies of the structure on. Zoneplate array lithography zpal is depicted sche matically in fig. Zoneplatearray lithography zpal is an opticalmasklesslithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of highnumericalaperture zone plates.
I explain in a few words how the pointspread function of the zone plate was measured experimentally. Photo plate lithography positive working plates introduction lithography literally means stone writing. Light hitting the zone plate will diffract around the opaque zones. An array of fresnel zone plates focuses incident radiation into an array of spots on a. Highthroughput synthesis of modified fresnel zone plate arrays via ion beam lithography. Singlebeam scanningelectronbeam lithography sebl systems are widely used in research and some lowvolume manufacturing. Pdf we present the first lithography results that use. This cited by count includes citations to the following articles in scholar. To date, feature sizes of 150nm have been demonstrated with zone plate lithography. The stone is then treated or etched with a solution of gum arabic and nitric acid. Maskless, zone plate array lithography zpal should be capable of producing 25 nm feature sizes at a throughput of 1 cm 2 second using 4. Weible,1 michael hornung,2 ralph zoberbier,2 elmar cullmann,2 lorenz stuerzebecher,3 torsten harzendorf,3 and uwe d. Cut new aluminum plate to size be aware of the size of the litho scraper bar when cutting plate, one dimension of the plate should be larger than the scraper bar is wide, taking care to keep grained surface clean and grease free to avoid having to counteretch the plate. Zoneplate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate.
Lithography of computergenerated holograms for freeform and. Resolution enhancement 40 xray lithography mask aligner and stepper 42 xray mask aligner has 2 key components. Fluorescence microscopy imaging with a fresnel zone plate. Derived from the early scanning electron microscopes, the technique in brief. Recently, microlenses have attracted more attention among optoelectronics device application developers. The spreading mechanism has been identified as the pointspread function of the zone plate lens. In the proposed model, the scattering on the fzps surface, reflection and refraction within groove zones are considered and diffraction fields are calculated using the vector rayleighsommerfeld integral. Traditionally lithography employs limestone as the matrix. Find materials for this course in the pages linked along the left. Zoneplatearraylithography what does zoneplatearray. An analytical model of vector formalism is proposed to investigate the diffraction of high numerical aperture subwavelength circular binary phase fresnel zone plate fzp. Desktop nanofabrication with massively multiplexed beam pen.
Assignments mit opencourseware free online course materials. Jun 01, 2000 read soft xrays for deep sub100 nm lithography, with and without masks, microelectronic engineering on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. The system development requires an efficient datadelivery system. Zone plate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates. Electron beam lithography ebl became the method of choice for zone plate fabrication with struc. Smitha department of electrical engineering and computer science, massachusetts institute of technology, cambridge, massachusetts 029 received 6 june 1996. Zoneplatearray lithography zpal uses an array of zone plates, combined with an array of micromechanical mirrors or shutters, to pattern features on a substrate without a mask. A proposal for maskless, zoneplatearray nanolithography. The development of a prototype zoneplatearray lithography. Us20040069957a1 system and method for maskless lithography. Schematic of the zone plate array lithography zpal system. Multiply the factor the image was scaled up by the focal length of the camera lens.
Zoneplatearray lithography using synchrotron radiation. Fresnel rings units containing 11 concentric rings were created on the pmma layer with the outermost fresnel ring, having an external diameter of. Assignments submicrometer and nanometer technology. Lecture 7 lithography and pattern transfer reading. Nanolithography outlines the present state of the art in lithographic techniques, including. This wavelength will allow a large depthoffocus with essentially no proximity effect at a large gap between the zoneplate array and the substrate. Introduction electron beam lithography is a specialized technique for creating extremely fine patterns 50 nm. Electrically switchable fresnel lens using a polymerseparated composite film yunhsing fan, hongwen ren, and shintson wu. Zone plate array lithography zpal is an opticalmaskless lithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of highnumericalaperture zone plates. Lithography from ancient greek, lithos, meaning stone, and. A maskiess lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In this technique, a controllable grating array creates a dotmatrixlike image on the photoresist. A proposal for maskless, zoneplatearray nanolithography henry i. In modern semiconductor manufacturing, photolithography uses optical radiation to image the mask on a silicon wafer using.
By scanning the wafer while changing the image, a larger complex image can be realized. Highthroughput synthesis of modified fresnel zone plate arrays via. The spatiallight modulator is an array of 1024 grating light valves from silicon light machines, the light source is a 400nm wavelength gan laser, the zone plates of the array are phase zone plates fabricated using sebl and hsq resist. Zone plate array lithography zpal is a directwrite technique using an array of zone plates to transfer patterns onto a substrate. However, desktop nanofabrication remains a formidable challenge because direct write systems available today, such as those that employ electron beam lithography ebl 1, nearfield optical lithography 27, zone plate array lithography 8, dippen nanolithography 9,10 and related molecular printing techniques 1114, impose tradeoffs between. This definition appears somewhat frequently and is. The tool has the potential to provide much higher quality cghs and other patternbased metrological. These arrays can be useful in applications such as zone plate array lithography, one shot xfel focusing or in combination with a matching array of ordersorting apertures, they. Smith research laboratory of electronics, massachusetts institute of technology, cambridge, massachussetts 029 erik h. Maskless, parallel patterning with zoneplate array lithography d. Fabrication of a fresnel zone plate through electron beam. This section contains assignment and solution files for the course assignments.
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